TY  - JOUR
T1  - XPS Investigation of a CDS-Based Photoresister under Working Conditions: Operando-XPS
A1  - H. Sezen, A.A. Rockett, S. Suzer
JA  - Analytical Chemistry
Y1  - 2012
VL  - 84
SP  - 2990
EP  - 2994
N1  - } doi number = {
ER  -